Tongay Lab

Close

Tongay Lab

Facilities

Material Synthesis and Manufacturing

Thin film growth systems: Our material synthesis capabilities cover rather broad range of techniques. Examples include; molecular beam epitaxy (MBE), chemical vapor deposition (CVD), MOCVD, EPCVD, physical vapor deposition (PVD), pulsed laser deposition (PLD), and many others

Bulk crystal growth techniques: CVT growth, Bridgman growth, hydrothermal synthesis, polymer growth (2D polymers), high pressure anvil growth, and others.

Material Characterization: Spectroscopy, microscopy, and electronic transport
The team specializes in material characterization of nanomaterials. Our techniques include but not limited to; atomic force microscopy (AFM), scanning tunneling spectroscopy (STS), scanning tunnelling spectroscopy (STM), Transmission electron microscopy (TEM and STEM), electronic characterization, optical spectroscopy. Measurement range covers from low 4K to high 1400K. AFM, STM, and STS measurements can be performed under controlled gaseous environment, liquid, and vacuum conditions. PPMS, VSM, MPMS, nanoindentation, and AFM nanoindenter for electronic, magnetic, and mechanical measurements. Catalysis station, nano-catalysis AFM/STM setup for artificial photosynthesis, catalysis, and electrochemistry.

Material processing
Our laboratory has the following processing techniques available to us; liquid phase exfoliation station, plasma processing chamber, intercalation chemistry bench, vacuum furnaces, spin coaters, solar generators, and mechanical testers

Molecular beam epitaxy tool
Routinely used microscopy tools
Glove box
Raman / PL spectrometer
Atomic force microscopy
Quantum Design PPMS system for electronic and magnetic measurements
ZnInSe crystals by CVT bulk crystal growth
Our high pressure setup integrated with optical spectroscopy
MBE chambers used in our labs
Pulsed laser deposition chamber
Our cubic press will have two major functions. In a single-stage mode: rapid synthesis of large samples from 1–7 GPa, and rapid pressure-temperature studies in the same region. In a double-stage mode: detailed work at > 30 GPa that current large-volume capabilities have not yet reached.
Our 6000 ton press will allow very large samples to be produced for a wide array of measurements and observations that cannot be made on smaller samples. The larger sample volume also allows for more complicated experiments.
Our high-pressure torsional device will be used to study material behavior and phase transitions caused by strain and will be used to create novel samples for TEM studies of deformational textures, phase transitions, and other phenomena.
One of the homemade CVD systems in our labs
Particle accelerator for dopants and defects engineering
Summary of our ultra-fast optical spectroscopy labs